Opportunity Information: Apply for DARPA BAA 12 43
Apply for DARPA BAA 12 43
- The DARPA Defense Sciences Office in the science and technology and other research and development sector is offering a public funding opportunity titled "Local Control of Materials Synthesis (LoCo)" and is now available to receive applicants.
- Interested and eligible applicants and submit their applications by referencing the CFDA number(s): 12.910 Research and Technology Development.
- This funding opportunity was created on May 30, 2012 and posted on May 3, 2012.
- Applicants must submit their applications by Jul 26, 2012. (Agency may still review applications by suitable applicants for the remaining/unused allocated funding in 2026.)
- Eligible applicants include: Unrestricted (i.e., open to any type of entity above), subject to any clarification in text field entitled Additional Information on Eligibility.
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Opportunity Summary:
The Local Control of Materials Synthesis (LoCo) opportunity is a DARPA Defense Sciences Office research program aimed at breaking a common bottleneck in thin film manufacturing for defense needs: many high-performance coatings and films require deposition temperatures that are simply too hot for the real-world substrates the Department of Defense wants to use. In practical terms, the program is trying to enable high-quality thin films, including extremely demanding materials like chemical vapor deposited diamond, to be deposited at much lower temperatures so they can be applied to temperature-sensitive substrates such as polymers or other components that would deform, outgas, or degrade under conventional processing conditions. The program frames this as a mismatch between the minimum processing temperature demanded by state-of-the-art deposition methods and the maximum temperature that key DoD substrates can tolerate.
LoCo is specifically looking for approaches that replace the usual "broadband heating" strategy typical of standard chemical vapor deposition, where the entire substrate and surrounding environment are heated to drive reactions and improve film growth. Instead, DARPA is seeking new chemical and physical methods that can deliver the necessary conditions for film formation in a more targeted way. The solicitation highlights the fundamental needs of thin film deposition such as providing sufficient reactant flux to the surface, enabling surface mobility so atoms can move into the right lattice positions, and supplying reaction energy to drive film-forming chemistry. The twist is that proposers are encouraged to achieve these requirements through localized or alternative energy delivery mechanisms rather than simply raising the overall temperature. In other words, the goal is to control the critical deposition variables directly at or near the growth interface so that the film grows correctly even when the bulk substrate remains relatively cool.
A notable feature of the program is its modular, complementary development approach. DARPA is inviting performers to independently develop novel processes (chemical, physical, or hybrid) that address specific parts of the deposition challenge. The intention is that multiple successful methods could later be integrated by DARPA into a combined toolchain capable of depositing a DoD-relevant thin film onto a DoD-relevant substrate. The announcement uses examples like depositing optically clear diamond (a film with exceptional hardness, thermal properties, and optical characteristics when done right) onto zinc sulfide (a material often associated with infrared optical windows and other sensor-related applications). Those examples convey the kind of performance-sensitive, application-driven targets DARPA has in mind: coatings that can enhance durability, optical transmission, environmental resistance, or thermal management without destroying or warping the underlying part during processing.
The solicitation strongly encourages participation from nontraditional performers, including teams that may not be part of the typical thin film deposition or materials processing community. It explicitly calls out fields like surface acoustic wave spectroscopy, plasma physics, and photochemistry as areas that might bring fresh mechanisms for delivering energy, activating chemistry, or monitoring and controlling growth in ways conventional CVD does not. This reflects DARPA's interest in unconventional pathways, such as using plasmas, photons, localized electric fields, acoustic energy, or other targeted stimuli to selectively activate reactions at the surface while keeping the overall thermal budget low. Alongside the technical research, DARPA also requests input on specific DoD systems and parts that would benefit if LoCo succeeds, signaling that the program is designed with technology transition in mind and wants to align research outcomes with real components and mission needs.
From an administrative standpoint, this was posted as DARPA BAA 12-43 under CFDA 12.910 (Research and Technology Development). The opportunity category is discretionary and supports multiple funding instrument types, including cooperative agreements, grants, other procurement contracts, and potentially other mechanisms. It does not require cost sharing or matching. Eligibility is described as unrestricted, meaning it is broadly open to many entity types, subject to any additional eligibility clarifications in the full announcement text. The opportunity was originally posted May 3, 2012, created May 30, 2012, and had a closing date of July 26, 2012, with an archive date of September 26, 2012. The listed point of contact for access issues was Dr. Brian Holloway, identified as the BAA Coordinator.
In short, LoCo is a DARPA effort to reinvent how thin films are synthesized when heat-sensitive substrates are involved, by developing low-temperature deposition processes that still satisfy the energetic and chemical demands of high-quality film growth. It seeks creative, cross-disciplinary ideas that can be developed independently and later combined into a practical capability to deposit strategically valuable films, such as optically clear diamond, onto operationally relevant DoD substrates and parts.
Local Control of Materials Synthesis (LoCo) - FAQs
What is the LoCo opportunity?
Local Control of Materials Synthesis (LoCo) is a DARPA Defense Sciences Office research program focused on overcoming a major bottleneck in thin film manufacturing for defense needs: many high-performance thin films and coatings typically require deposition temperatures that are too high for real-world Department of Defense substrates.
What problem is DARPA trying to solve with LoCo?
LoCo targets the mismatch between (1) the minimum processing temperature required by state-of-the-art thin film deposition methods and (2) the maximum temperature that key DoD substrates can tolerate. Many DoD-relevant substrates can deform, outgas, or degrade under conventional high-temperature processing.
What is the main technical goal of the program?
The goal is to enable high-quality thin films to be deposited at much lower temperatures than traditional approaches, so that these films can be applied to temperature-sensitive substrates (such as polymers and other vulnerable components) without damaging the substrate.
What kinds of thin films are in scope?
The program is interested in high-performance coatings and films, including extremely demanding materials such as chemical vapor deposited (CVD) diamond. The solicitation uses optically clear diamond as an example of the type of performance-sensitive film DARPA has in mind.
Why is CVD diamond mentioned specifically?
CVD diamond is used as an example of a film that is difficult and demanding to deposit well. When achieved, it can offer exceptional hardness, thermal properties, and optical characteristics. LoCo is interested in enabling films of this caliber at lower processing temperatures.
What types of substrates is LoCo focused on?
LoCo is focused on substrates that cannot tolerate typical deposition temperatures, including polymers and other components that would deform, outgas, or degrade. The announcement also uses zinc sulfide as an illustrative DoD-relevant substrate example (often associated with infrared optical windows and sensor applications).
What is DARPA trying to change about conventional deposition methods?
LoCo seeks alternatives to the standard "broadband heating" strategy common in conventional chemical vapor deposition, where the entire substrate and surrounding environment are heated to drive reactions and support film growth. Instead, DARPA wants approaches that deliver the necessary conditions for film formation in a more targeted or localized way.
What does "local control" mean in this program?
In LoCo, "local control" refers to controlling critical deposition variables directly at or near the growth interface so the film grows correctly while keeping the bulk substrate relatively cool, rather than relying on heating the entire system.
What fundamental needs of thin film deposition does the solicitation highlight?
The solicitation highlights needs such as providing sufficient reactant flux to the surface, enabling surface mobility so atoms can move into correct lattice positions, and supplying reaction energy to drive film-forming chemistry. LoCo encourages meeting these needs through localized or alternative energy delivery mechanisms.
What kinds of approaches is DARPA looking for?
DARPA is seeking novel chemical, physical, or hybrid processes that replace or reduce reliance on overall high-temperature processing. The program encourages unconventional mechanisms for delivering energy or activating chemistry near the surface so film formation can occur without heating the entire substrate.
Are proposers required to build a complete end-to-end deposition tool?
The program emphasizes a modular, complementary development approach. Performers are invited to independently develop novel processes that address specific parts of the deposition challenge, with the intent that multiple successful methods could later be integrated by DARPA into a combined toolchain.
What does DARPA mean by a "modular, complementary development approach"?
It means different teams can develop different enabling methods (chemical, physical, or hybrid) that solve pieces of the overall low-temperature deposition problem. DARPA may later integrate multiple successful methods into a toolchain capable of depositing a DoD-relevant film onto a DoD-relevant substrate.
What is an example target combination mentioned in the announcement?
The solicitation provides an illustrative example of depositing optically clear diamond onto zinc sulfide, which signals the kind of demanding film/substrate combinations and performance-driven outcomes the program is interested in.
What kinds of benefits does DARPA associate with the targeted coatings and films?
The examples indicate interest in coatings that can enhance durability, optical transmission, environmental resistance, or thermal management, while avoiding damage to the underlying part during processing.
Who is encouraged to participate?
The solicitation strongly encourages participation from nontraditional performers, including teams that may not be part of the typical thin film deposition or materials processing community.
What nontraditional fields are explicitly called out as potentially relevant?
The announcement explicitly calls out areas such as surface acoustic wave spectroscopy, plasma physics, and photochemistry as fields that might contribute new ways to deliver energy, activate chemistry, or monitor and control growth beyond conventional CVD methods.
Does LoCo encourage unconventional energy delivery or activation mechanisms?
Yes. The solicitation reflects interest in unconventional pathways for selectively activating reactions at the surface while keeping the overall thermal budget low, including mechanisms involving plasmas, photons, localized electric fields, acoustic energy, or other targeted stimuli.
Is technology transition to real DoD systems part of the program intent?
Yes. DARPA requests input on specific DoD systems and parts that would benefit if LoCo succeeds, indicating the program is designed with technology transition in mind and aims to align research outcomes with real components and mission needs.
What is the official solicitation identifier?
The opportunity was posted as DARPA BAA 12-43.
What CFDA number is associated with this opportunity?
The opportunity lists CFDA 12.910 (Research and Technology Development).
What is the opportunity category?
The opportunity category is listed as discretionary.
What funding instrument types are supported?
The announcement indicates multiple instrument types may be used, including cooperative agreements, grants, other procurement contracts, and potentially other mechanisms.
Is cost sharing or matching required?
No. The opportunity states that cost sharing or matching is not required.
Who is eligible to apply?
Eligibility is described as unrestricted, meaning it is broadly open to many entity types, subject to any additional eligibility clarifications in the full announcement text.
When was the opportunity posted and when did it close?
The opportunity was originally posted on May 3, 2012, created on May 30, 2012, and had a closing date of July 26, 2012. The archive date is listed as September 26, 2012.
Who is the point of contact listed for access issues?
The listed point of contact for access issues is Dr. Brian Holloway, identified as the BAA Coordinator.
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